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Spacer FinFET: Nano-scale CMOS Technology for the Terabit Era

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dc.contributor.authorChoi, Yang-Kyu-
dc.contributor.authorKing, Tsu-Jae-
dc.contributor.authorHu, Chenming-
dc.date.accessioned2013-03-16T10:45:19Z-
dc.date.available2013-03-16T10:45:19Z-
dc.date.created2012-02-06-
dc.date.issued2001-12-
dc.identifier.citationInternational Semiconductor Device Research Symposium, v., no., pp.543 - 546-
dc.identifier.urihttp://hdl.handle.net/10203/130493-
dc.languageENG-
dc.titleSpacer FinFET: Nano-scale CMOS Technology for the Terabit Era-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage543-
dc.citation.endingpage546-
dc.citation.publicationnameInternational Semiconductor Device Research Symposium-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorKing, Tsu-Jae-
dc.contributor.nonIdAuthorHu, Chenming-
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EE-Conference Papers(학술회의논문)
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