Bipolar current stressing and electrical recovery of quasi-breakdown in thin gate oxidesBipolar current stressing and electrical recovery of quasi-breakdown in thin gate oxides

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorLoh, WY-
dc.contributor.authorLi, MF-
dc.contributor.authorXu, Z-
dc.date.accessioned2013-03-16T10:31:53Z-
dc.date.available2013-03-16T10:31:53Z-
dc.date.created2012-02-06-
dc.date.issued2001-07-09-
dc.identifier.citation8th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), v., no., pp.59 - 59-
dc.identifier.urihttp://hdl.handle.net/10203/130395-
dc.languageENG-
dc.titleBipolar current stressing and electrical recovery of quasi-breakdown in thin gate oxides-
dc.title.alternativeBipolar current stressing and electrical recovery of quasi-breakdown in thin gate oxides-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage59-
dc.citation.endingpage59-
dc.citation.publicationname8th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA)-
dc.identifier.conferencecountrySingapore-
dc.identifier.conferencecountrySingapore-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorLoh, WY-
dc.contributor.nonIdAuthorLi, MF-
dc.contributor.nonIdAuthorXu, Z-
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EE-Conference Papers(학술회의논문)
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