Numerical analysis of uniformity optimization for rotating multi wafer by MOCVD process

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dc.contributor.authorLim, H. T.-
dc.contributor.authorKo, Seung Hwan-
dc.contributor.authorKim, C. J.-
dc.date.accessioned2013-03-16T10:16:48Z-
dc.date.available2013-03-16T10:16:48Z-
dc.date.created2012-02-06-
dc.date.issued2002-11-01-
dc.identifier.citationKSME Academy-Industry Joint Conference, v., no., pp.0 - 0-
dc.identifier.urihttp://hdl.handle.net/10203/130246-
dc.languageKOR-
dc.publisherKSME-
dc.titleNumerical analysis of uniformity optimization for rotating multi wafer by MOCVD process-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage0-
dc.citation.endingpage0-
dc.citation.publicationnameKSME Academy-Industry Joint Conference-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKo, Seung Hwan-
dc.contributor.nonIdAuthorLim, H. T.-
dc.contributor.nonIdAuthorKim, C. J.-
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ME-Conference Papers(학술회의논문)
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