Dry-Developable Resist Based on Methacrylate Polymer with 2-Trimethylsilyl-2-Propyl Ester Group
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | - |
| dc.contributor.author | Kim, Hyun-Woo | - |
| dc.date.accessioned | 2013-03-16T09:15:26Z | - |
| dc.date.available | 2013-03-16T09:15:26Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999 | - |
| dc.identifier.citation | Asian Photochemistry Conference, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/129752 | - |
| dc.language | ENG | - |
| dc.title | Dry-Developable Resist Based on Methacrylate Polymer with 2-Trimethylsilyl-2-Propyl Ester Group | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Asian Photochemistry Conference | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Kim, Hyun-Woo | - |
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