DC Field | Value | Language |
---|---|---|
dc.contributor.author | KANG SANG WON | - |
dc.date.accessioned | 2013-03-16T06:25:35Z | - |
dc.date.available | 2013-03-16T06:25:35Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-01-01 | - |
dc.identifier.citation | The Second Asian Conference on Chemical Vapor Deposition, v., no., pp.190 - 193 | - |
dc.identifier.uri | http://hdl.handle.net/10203/128378 | - |
dc.language | ENG | - |
dc.title | Tantalum Oxide Films Grown by Plasma-Enhanced Atomic Layer Deposition | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 190 | - |
dc.citation.endingpage | 193 | - |
dc.citation.publicationname | The Second Asian Conference on Chemical Vapor Deposition | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | KANG SANG WON | - |
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