Tantalum Oxide Films grown by plasma enhanced atomic layer deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | KANG SANG WON | - |
| dc.date.accessioned | 2013-03-16T06:25:28Z | - |
| dc.date.available | 2013-03-16T06:25:28Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2001-01-01 | - |
| dc.identifier.citation | 2nd International AVS Conference on Microelectronics and Interfaces, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/128377 | - |
| dc.language | ENG | - |
| dc.title | Tantalum Oxide Films grown by plasma enhanced atomic layer deposition | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 2nd International AVS Conference on Microelectronics and Interfaces | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | KANG SANG WON | - |
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