DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ko, HS | - |
dc.contributor.author | Nah, JW | - |
dc.contributor.author | Paik, Kyung-Wook | - |
dc.contributor.author | Park, Y | - |
dc.date.accessioned | 2013-03-16T05:45:20Z | - |
dc.date.available | 2013-03-16T05:45:20Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-10-01 | - |
dc.identifier.citation | 20th North American Conference on Molecular Beam Epitaxy, v.20, no.3, pp.1000 - 1007 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/128061 | - |
dc.language | ENG | - |
dc.title | Effects of the polymer residues on via contact resistance after reactive ion etching | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0035998526 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 20 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 1000 | - |
dc.citation.endingpage | 1007 | - |
dc.citation.publicationname | 20th North American Conference on Molecular Beam Epitaxy | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Paik, Kyung-Wook | - |
dc.contributor.nonIdAuthor | Ko, HS | - |
dc.contributor.nonIdAuthor | Nah, JW | - |
dc.contributor.nonIdAuthor | Park, Y | - |
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