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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Effects of the polymer residues on via contact resistance after reactive ion etching

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dc.contributor.authorKo, HS-
dc.contributor.authorNah, JW-
dc.contributor.authorPaik, Kyung-Wook-
dc.contributor.authorPark, Y-
dc.date.accessioned2013-03-16T05:45:20Z-
dc.date.available2013-03-16T05:45:20Z-
dc.date.created2012-02-06-
dc.date.issued2001-10-01-
dc.identifier.citation20th North American Conference on Molecular Beam Epitaxy, v.20, no.3, pp.1000 - 1007-
dc.identifier.issn1071-1023-
dc.identifier.urihttp://hdl.handle.net/10203/128061-
dc.languageENG-
dc.titleEffects of the polymer residues on via contact resistance after reactive ion etching-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0035998526-
dc.type.rimsCONF-
dc.citation.volume20-
dc.citation.issue3-
dc.citation.beginningpage1000-
dc.citation.endingpage1007-
dc.citation.publicationname20th North American Conference on Molecular Beam Epitaxy-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorPaik, Kyung-Wook-
dc.contributor.nonIdAuthorKo, HS-
dc.contributor.nonIdAuthorNah, JW-
dc.contributor.nonIdAuthorPark, Y-
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MS-Conference Papers(학술회의논문)
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