Chemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group

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dc.contributor.authorKim, Jin-Baek-
dc.contributor.authorKang, Jae-Sung-
dc.date.accessioned2013-03-16T04:00:56Z-
dc.date.available2013-03-16T04:00:56Z-
dc.date.created2012-02-06-
dc.date.issued1999-
dc.identifier.citation한국고분자학회 1999년 춘계 학술대회 , v., no., pp.209 - 209-
dc.identifier.urihttp://hdl.handle.net/10203/127243-
dc.languageENG-
dc.publisher한국고분자학회-
dc.titleChemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage209-
dc.citation.endingpage209-
dc.citation.publicationname한국고분자학회 1999년 춘계 학술대회-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorKang, Jae-Sung-
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CH-Conference Papers(학술회의논문)
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