Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.contributor.author | Lee, Jae Jun | ko |
| dc.contributor.author | Kang, Jae-Sung | ko |
| dc.date.accessioned | 2013-03-16T03:56:13Z | - |
| dc.date.available | 2013-03-16T03:56:13Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2000-02-28 | - |
| dc.identifier.citation | Advances in Resist Technology and Processing XVII, pp.1079 - 1087 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/127214 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000088786500109 | - |
| dc.identifier.scopusid | 2-s2.0-0033692325 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 1079 | - |
| dc.citation.endingpage | 1087 | - |
| dc.citation.publicationname | Advances in Resist Technology and Processing XVII | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Santa Clara, CA | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Lee, Jae Jun | - |
| dc.contributor.nonIdAuthor | Kang, Jae-Sung | - |
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