Graded Etching of Thermal Oxide with Various Angles using Silicafilm
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Yearn-Ik | ko |
| dc.contributor.author | Kwon, Young Se | ko |
| dc.contributor.author | Kim, Choong-Ki | ko |
| dc.date.accessioned | 2007-09-04T01:03:52Z | - |
| dc.date.available | 2007-09-04T01:03:52Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1980-03 | - |
| dc.identifier.citation | IEEE ELECTRON DEVICE LETTERS, v.1, no.3, pp.30 - 31 | - |
| dc.identifier.issn | 0741-3106 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/1269 | - |
| dc.language | English | - |
| dc.language.iso | en_US | en |
| dc.publisher | IEEE-Inst Electrical Electronics Engineers Inc | - |
| dc.title | Graded Etching of Thermal Oxide with Various Angles using Silicafilm | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1980JM50300002 | - |
| dc.identifier.scopusid | 2-s2.0-0018997235 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 1 | - |
| dc.citation.issue | 3 | - |
| dc.citation.beginningpage | 30 | - |
| dc.citation.endingpage | 31 | - |
| dc.citation.publicationname | IEEE ELECTRON DEVICE LETTERS | - |
| dc.embargo.liftdate | 9999-12-31 | - |
| dc.embargo.terms | 9999-12-31 | - |
| dc.contributor.localauthor | Kwon, Young Se | - |
| dc.contributor.nonIdAuthor | Choi, Yearn-Ik | - |
| dc.contributor.nonIdAuthor | Kim, Choong-Ki | - |
| dc.type.journalArticle | Article | - |
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