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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

40 nm Electron Beam Patterning and its Application to Silicon Nano-Structure Fabrication

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dc.contributor.authorLee, Kwyro-
dc.contributor.authorShin, Hyung-Cheol-
dc.contributor.authorHan, S. Y.-
dc.contributor.authorPark, T. J.-
dc.contributor.authorKim, B. K.-
dc.date.accessioned2013-03-16T02:21:50Z-
dc.date.available2013-03-16T02:21:50Z-
dc.date.created2012-02-06-
dc.date.issued1999-
dc.identifier.citationICVC, v., no., pp.163 - 165-
dc.identifier.urihttp://hdl.handle.net/10203/126435-
dc.languageENG-
dc.title40 nm Electron Beam Patterning and its Application to Silicon Nano-Structure Fabrication-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage163-
dc.citation.endingpage165-
dc.citation.publicationnameICVC-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorLee, Kwyro-
dc.contributor.localauthorShin, Hyung-Cheol-
dc.contributor.nonIdAuthorHan, S. Y.-
dc.contributor.nonIdAuthorPark, T. J.-
dc.contributor.nonIdAuthorKim, B. K.-
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EE-Conference Papers(학술회의논문)
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