Molecular Resists with t-Butyl Cholate as a Dendrimer Core for 193 nm Photoresists
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.contributor.author | Oh, Tae-Hwan | ko |
| dc.date.accessioned | 2013-03-16T00:51:39Z | - |
| dc.date.available | 2013-03-16T00:51:39Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2002-03-04 | - |
| dc.identifier.citation | Advances in Resist Technology and Processing XIX, pp.333 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/125732 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Molecular Resists with t-Butyl Cholate as a Dendrimer Core for 193 nm Photoresists | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000178056500061 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 333 | - |
| dc.citation.endingpage | 333 | - |
| dc.citation.publicationname | Advances in Resist Technology and Processing XIX | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Santa Clara | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Oh, Tae-Hwan | - |
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