Preparation and characterization of hydrogenated aluminum nitride ( AlN:H ) films by sputtering and application to SAW devices

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dc.contributor.authorLee, Jai Young-
dc.date.accessioned2013-03-15T21:19:19Z-
dc.date.available2013-03-15T21:19:19Z-
dc.date.created2012-02-06-
dc.date.issued1997-
dc.identifier.citationJIM, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/123994-
dc.languageENG-
dc.titlePreparation and characterization of hydrogenated aluminum nitride ( AlN:H ) films by sputtering and application to SAW devices-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameJIM-
dc.identifier.conferencecountryJapan-
dc.contributor.localauthorLee, Jai Young-
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MS-Conference Papers(학술회의논문)
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