DSpace at KOASAS: Improved Copper Chemical Vapor Deposition Process by Applying Substrate Bias

DSpace at KOASAS

College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Improved Copper Chemical Vapor Deposition Process by Applying Substrate Bias

Cited 0 time in webofscience

Cited 0 time in scopus

Hit : 348
Download : 0

Export

Park, Chong-Ook researcher / Lee, Won-Jun / Rha, Sa-Kyun / Lee, Seung-Yun / Kim, Dong-Won / Chun, Soung-Soon

Issue Date: 1996-04-08

Language: ENG

Citation: 1996 MRS Spring Symposium, v.427, pp.207 - 212

ISSN: 0272-9172

URI: http://hdl.handle.net/10203/123993

Appears in Collection: MS-Conference Papers(학술회의논문)

Files in This Item: There are no files associated with this item.

Display Full Item Record

qr_code

트윗하기

KOASAS

Knowledge Service Development Team, KAIST 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. T. 82-42-350-4493 Email. koasas@kaist.ac.kr
Copyright © 2016. Korea Advanced Institute of Science and Technology. All Rights Reserved.

KOASAS

KOASAS

Browse

Improved Copper Chemical Vapor Deposition Process by Applying Substrate Bias

KOASAS

Communities & Collections