An Overview and Future Development of Single-Layer Halftone Phase-shifting Mask (SLHTPSM) Materials for DUV Microlithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 배병수 | - |
| dc.contributor.author | Jiang, ZT | - |
| dc.contributor.author | 홍승범 | - |
| dc.contributor.author | Kim, EH | - |
| dc.contributor.author | Lim, SC | - |
| dc.contributor.author | Woo, SG | - |
| dc.contributor.author | 고영범 | - |
| dc.contributor.author | 노광수 | - |
| dc.date.accessioned | 2013-03-15T20:56:49Z | - |
| dc.date.available | 2013-03-15T20:56:49Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1996 | - |
| dc.identifier.citation | 한국요업학회 추계학술발표대회 , v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/123792 | - |
| dc.language | KOR | - |
| dc.publisher | 한국요업학회 | - |
| dc.title | An Overview and Future Development of Single-Layer Halftone Phase-shifting Mask (SLHTPSM) Materials for DUV Microlithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 한국요업학회 추계학술발표대회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 배병수 | - |
| dc.contributor.localauthor | 노광수 | - |
| dc.contributor.nonIdAuthor | Jiang, ZT | - |
| dc.contributor.nonIdAuthor | 홍승범 | - |
| dc.contributor.nonIdAuthor | Kim, EH | - |
| dc.contributor.nonIdAuthor | Lim, SC | - |
| dc.contributor.nonIdAuthor | Woo, SG | - |
| dc.contributor.nonIdAuthor | 고영범 | - |
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