An Overview and Future Development of Single-Layer Halftone Phase-shifting Mask (SLHTPSM) Materials for DUV Microlithography

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dc.contributor.author배병수-
dc.contributor.authorJiang, ZT-
dc.contributor.author홍승범-
dc.contributor.authorKim, EH-
dc.contributor.authorLim, SC-
dc.contributor.authorWoo, SG-
dc.contributor.author고영범-
dc.contributor.author노광수-
dc.date.accessioned2013-03-15T20:56:49Z-
dc.date.available2013-03-15T20:56:49Z-
dc.date.created2012-02-06-
dc.date.issued1996-
dc.identifier.citation한국요업학회 추계학술발표대회 , v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/123792-
dc.languageKOR-
dc.publisher한국요업학회-
dc.titleAn Overview and Future Development of Single-Layer Halftone Phase-shifting Mask (SLHTPSM) Materials for DUV Microlithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname한국요업학회 추계학술발표대회-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor배병수-
dc.contributor.localauthor노광수-
dc.contributor.nonIdAuthorJiang, ZT-
dc.contributor.nonIdAuthor홍승범-
dc.contributor.nonIdAuthorKim, EH-
dc.contributor.nonIdAuthorLim, SC-
dc.contributor.nonIdAuthorWoo, SG-
dc.contributor.nonIdAuthor고영범-
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MS-Conference Papers(학술회의논문)
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