Characterization of a-SiNx thin film deposited by inductively coupled plasma enhanced chemical vapor deposition

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Publisher
MRS
Issue Date
1996-12-02
Language
ENG
Citation

Proceedings of the 1996 MRS Fall Meeting, v.446, pp.139 - 144

ISSN
0272-9172
URI
http://hdl.handle.net/10203/123436
Appears in Collection
MS-Conference Papers(학술회의논문)
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