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College of Natural Sciences(자연과학대학)Dept. of Physics(물리학과)PH-Conference Papers(학술회의논문)

Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant

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dc.contributor.authorKim, JH-
dc.contributor.authorSeo, SH-
dc.contributor.authorYun, SM-
dc.contributor.authorChang, Hong-Young-
dc.date.accessioned2013-03-15T18:49:25Z-
dc.date.available2013-03-15T18:49:25Z-
dc.date.created2012-02-06-
dc.date.issued1995-
dc.identifier.citationThe Electrochemical society meeting, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/122633-
dc.languageENG-
dc.publisherThe Electrochemical society-
dc.titleProduction of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameThe Electrochemical society meeting-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorChang, Hong-Young-
dc.contributor.nonIdAuthorKim, JH-
dc.contributor.nonIdAuthorSeo, SH-
dc.contributor.nonIdAuthorYun, SM-
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PH-Conference Papers(학술회의논문)
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