고밀도 Helicon Plasma를 이용한 저유전율의 SiOF박막 증착 연구

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dc.contributor.author김정형-
dc.contributor.author서상훈-
dc.contributor.author윤석민-
dc.contributor.author장홍영-
dc.date.accessioned2013-03-15T18:32:21Z-
dc.date.available2013-03-15T18:32:21Z-
dc.date.created2012-02-06-
dc.date.issued1995-
dc.identifier.citation한국진공학회 제9회 학술발표회, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/122466-
dc.languageKOR-
dc.publisher한국진공학회-
dc.title고밀도 Helicon Plasma를 이용한 저유전율의 SiOF박막 증착 연구-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname한국진공학회 제9회 학술발표회-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor장홍영-
dc.contributor.nonIdAuthor김정형-
dc.contributor.nonIdAuthor서상훈-
dc.contributor.nonIdAuthor윤석민-
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PH-Conference Papers(학술회의논문)
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