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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Deposition of Low Dielectric a-C:F Thin Films Using ICP-CVD

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dc.contributor.authorBae, Byeong-Soo-
dc.contributor.authorHan, SS-
dc.contributor.authorKim, TK-
dc.date.accessioned2013-03-15T18:31:15Z-
dc.date.available2013-03-15T18:31:15Z-
dc.date.created2012-02-06-
dc.date.issued1998-
dc.identifier.citationPacRim3, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/122457-
dc.languageENG-
dc.titleDeposition of Low Dielectric a-C:F Thin Films Using ICP-CVD-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnamePacRim3-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.nonIdAuthorHan, SS-
dc.contributor.nonIdAuthorKim, TK-
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MS-Conference Papers(학술회의논문)
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