DC Field | Value | Language |
---|---|---|
dc.contributor.author | 최시경 | - |
dc.contributor.author | 김석필 | - |
dc.date.accessioned | 2013-03-15T18:17:11Z | - |
dc.date.available | 2013-03-15T18:17:11Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997 | - |
dc.identifier.citation | 추계 한국요업학회, v., no., pp.166 - | - |
dc.identifier.uri | http://hdl.handle.net/10203/122286 | - |
dc.language | KOR | - |
dc.title | Residual Stress and Electrical Property with Deposition Parameter of Low Dielectric SiOF Thin Films Deposited by ECRCVD | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 166 | - |
dc.citation.publicationname | 추계 한국요업학회 | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | 최시경 | - |
dc.contributor.nonIdAuthor | 김석필 | - |
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