DSpace at KOASAS: Residual Stress and Electrical Property with Deposition Parameter of Low Dielectric SiOF Thin Films Deposited by ECRCVD

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Residual Stress and Electrical Property with Deposition Parameter of Low Dielectric SiOF Thin Films Deposited by ECRCVD

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최시경 researcher / 김석필

Issue Date: 1997

Language: KOR

Citation: 추계 한국요업학회, pp.166 -

URI: http://hdl.handle.net/10203/122286

Appears in Collection: MS-Conference Papers(학술회의논문)

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