DC Field | Value | Language |
---|---|---|
dc.contributor.author | Seo, SH | - |
dc.contributor.author | Kim, JH | - |
dc.contributor.author | Lee, PW | - |
dc.contributor.author | Chang, Hong-Young | - |
dc.date.accessioned | 2013-03-15T18:00:07Z | - |
dc.date.available | 2013-03-15T18:00:07Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1995 | - |
dc.identifier.citation | The Electrochemical society meeting, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/122114 | - |
dc.language | ENG | - |
dc.publisher | The Electrochemical Society | - |
dc.title | Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | The Electrochemical society meeting | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Chang, Hong-Young | - |
dc.contributor.nonIdAuthor | Seo, SH | - |
dc.contributor.nonIdAuthor | Kim, JH | - |
dc.contributor.nonIdAuthor | Lee, PW | - |
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