DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chang, Choong-Seock | - |
dc.date.accessioned | 2013-03-15T17:11:49Z | - |
dc.date.available | 2013-03-15T17:11:49Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1998 | - |
dc.identifier.citation | Asia-Pacific Conference on Plasma Science & Technology, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/121683 | - |
dc.language | ENG | - |
dc.title | Theoretical Simulation of Inductively Coupled Plasma Etcher | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | Asia-Pacific Conference on Plasma Science & Technology | - |
dc.identifier.conferencecountry | Australia | - |
dc.identifier.conferencecountry | Australia | - |
dc.contributor.localauthor | Chang, Choong-Seock | - |
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