Orientation characteristics with Process Parameters of PLZT(x/0/100) thin Films Prepared by rf-magnetron Sputtering

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dc.contributor.authorNo, Kwangsoo-
dc.date.accessioned2013-03-15T16:36:44Z-
dc.date.available2013-03-15T16:36:44Z-
dc.date.created2012-02-06-
dc.date.issued1996-01-01-
dc.identifier.citationMRS, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/121381-
dc.languageENG-
dc.publisherMRS-
dc.titleOrientation characteristics with Process Parameters of PLZT(x/0/100) thin Films Prepared by rf-magnetron Sputtering-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameMRS-
dc.contributor.localauthorNo, Kwangsoo-
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MS-Conference Papers(학술회의논문)
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