Stability and Migration Mechanism of Self-interstitials in Si

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dc.contributor.authorLee, WC-
dc.contributor.authorLee, SG-
dc.contributor.authorChang, Kee-Joo-
dc.date.accessioned2013-03-15T15:59:16Z-
dc.date.available2013-03-15T15:59:16Z-
dc.date.created2012-02-06-
dc.date.issued1995-
dc.identifier.citation한국물리학회 학술발표회, v., no., pp.358 - 358-
dc.identifier.urihttp://hdl.handle.net/10203/121013-
dc.languageENG-
dc.publisher한국물리학회-
dc.titleStability and Migration Mechanism of Self-interstitials in Si-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage358-
dc.citation.endingpage358-
dc.citation.publicationname한국물리학회 학술발표회-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorChang, Kee-Joo-
dc.contributor.nonIdAuthorLee, WC-
dc.contributor.nonIdAuthorLee, SG-
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PH-Conference Papers(학술회의논문)
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