DC Field | Value | Language |
---|---|---|
dc.contributor.author | No, Kwangsoo | - |
dc.contributor.author | Kim, Eun Ah | - |
dc.contributor.author | Hong, Seung Bum | - |
dc.contributor.author | Moon, Seong-Yong | - |
dc.date.accessioned | 2013-03-15T14:42:34Z | - |
dc.date.available | 2013-03-15T14:42:34Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997 | - |
dc.identifier.citation | Third International Symposium on 193nm Lithography, v., no., pp.127 - | - |
dc.identifier.uri | http://hdl.handle.net/10203/120378 | - |
dc.language | ENG | - |
dc.title | Chromium Aluminim Oxide Phase-Shifting Mask Material for 193nm Lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 127 | - |
dc.citation.publicationname | Third International Symposium on 193nm Lithography | - |
dc.identifier.conferencecountry | Japan | - |
dc.identifier.conferencecountry | Japan | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Kim, Eun Ah | - |
dc.contributor.nonIdAuthor | Hong, Seung Bum | - |
dc.contributor.nonIdAuthor | Moon, Seong-Yong | - |
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