Planar Circular Magnetron Sputtering 에서의 두께 균일도에 대한 모델 연구

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Publisher
한국요업학회
Issue Date
1995-01-01
Language
KOR
Citation

한국요업학회 추계발표대회

URI
http://hdl.handle.net/10203/119964
Appears in Collection
MS-Conference Papers(학술회의논문)
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