Investigation of the gate oxide integrity of the nitrided gate oxide using nitrogen implantation into polysilicon gateInvestigation of the gate oxide integrity of the nitrided gate oxide using nitrogen implantation into polysilicon gate

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Issue Date
1998-11-30
Language
ENG
Citation

Abstract Proc. of the Asia-Pacific SIA'98 Conf., pp.0 - 0

URI
http://hdl.handle.net/10203/119480
Appears in Collection
EE-Conference Papers(학술회의논문)
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