Preparation of a-SiC:H Films Using Si2H6 and C2H4 by Direct Photo Chemical Vapor Deposition Method and Their Application to Thin-Film Light-Emitting Diode

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dc.contributor.authorLim, Koeng Su-
dc.date.accessioned2013-03-15T12:20:00Z-
dc.date.available2013-03-15T12:20:00Z-
dc.date.created2012-02-06-
dc.date.issued1995-01-01-
dc.identifier.citation, v., no., pp.687 - 690-
dc.identifier.urihttp://hdl.handle.net/10203/119415-
dc.languageKOR-
dc.titlePreparation of a-SiC:H Films Using Si2H6 and C2H4 by Direct Photo Chemical Vapor Deposition Method and Their Application to Thin-Film Light-Emitting Diode-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage687-
dc.citation.endingpage690-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorLim, Koeng Su-
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EE-Conference Papers(학술회의논문)
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