Preparation of a-SiC:H Films Using Si2H6 and C2H4 by Direct Photo Chemical Vapor Deposition Method and Their Application to Thin-Film Light-Emitting Diode

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Issue Date
1995-01-01
Language
KOR
Citation

pp.687 - 690

URI
http://hdl.handle.net/10203/119415
Appears in Collection
EE-Conference Papers(학술회의논문)
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