Preparation of a-SiC:H Films Using Si2H6 and C2H4 by Direct Photo Chemical Vapor Deposition Method and Their Application to Thin-Film Light-Emitting Diode
- Issue Date
- 1995-01-01
- Language
- KOR
- Citation
pp.687 - 690
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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