The Novel Water Developable Photoresist for Deep UV Lithography

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dc.contributor.authorJung, Min Ho-
dc.contributor.authorKim, Jin-Baek-
dc.date.accessioned2013-03-15T12:14:51Z-
dc.date.available2013-03-15T12:14:51Z-
dc.date.created2012-02-06-
dc.date.issued1996-04-
dc.identifier.citation한국고분자학회 1996년도 춘계 학술대회 , v., no., pp.196 - 197-
dc.identifier.urihttp://hdl.handle.net/10203/119382-
dc.languageENG-
dc.publisher한국고분자학회-
dc.titleThe Novel Water Developable Photoresist for Deep UV Lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage196-
dc.citation.endingpage197-
dc.citation.publicationname한국고분자학회 1996년도 춘계 학술대회-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorJung, Min Ho-
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CH-Conference Papers(학술회의논문)
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