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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Applicability of fluorinated silicon nitride film as bottom antireflective layer in deep ultraviolet lithography

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dc.contributor.authorJun, Byung-Hyuk-
dc.contributor.authorHan, Sang-Soo-
dc.contributor.authorKim, Dong-Wan-
dc.contributor.authorKang, Ho-Young-
dc.contributor.authorKoh, Young-Bum-
dc.contributor.authorBae, Byeong-Soo-
dc.contributor.authorNo, Kwangsoo-
dc.date.accessioned2013-03-15T10:52:20Z-
dc.date.available2013-03-15T10:52:20Z-
dc.date.created2012-02-06-
dc.date.issued1996-12-02-
dc.identifier.citationProceedings of the 1996 MRS Fall Meeting, v.446, no., pp.115 - 120-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/10203/118799-
dc.languageENG-
dc.publisherMRS-
dc.titleApplicability of fluorinated silicon nitride film as bottom antireflective layer in deep ultraviolet lithography-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0030673284-
dc.type.rimsCONF-
dc.citation.volume446-
dc.citation.beginningpage115-
dc.citation.endingpage120-
dc.citation.publicationnameProceedings of the 1996 MRS Fall Meeting-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorJun, Byung-Hyuk-
dc.contributor.nonIdAuthorHan, Sang-Soo-
dc.contributor.nonIdAuthorKim, Dong-Wan-
dc.contributor.nonIdAuthorKang, Ho-Young-
dc.contributor.nonIdAuthorKoh, Young-Bum-
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MS-Conference Papers(학술회의논문)
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