DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jun, Byung-Hyuk | - |
dc.contributor.author | Han, Sang-Soo | - |
dc.contributor.author | Kim, Dong-Wan | - |
dc.contributor.author | Kang, Ho-Young | - |
dc.contributor.author | Koh, Young-Bum | - |
dc.contributor.author | Bae, Byeong-Soo | - |
dc.contributor.author | No, Kwangsoo | - |
dc.date.accessioned | 2013-03-15T10:52:20Z | - |
dc.date.available | 2013-03-15T10:52:20Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1996-12-02 | - |
dc.identifier.citation | Proceedings of the 1996 MRS Fall Meeting, v.446, no., pp.115 - 120 | - |
dc.identifier.issn | 0272-9172 | - |
dc.identifier.uri | http://hdl.handle.net/10203/118799 | - |
dc.language | ENG | - |
dc.publisher | MRS | - |
dc.title | Applicability of fluorinated silicon nitride film as bottom antireflective layer in deep ultraviolet lithography | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0030673284 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 446 | - |
dc.citation.beginningpage | 115 | - |
dc.citation.endingpage | 120 | - |
dc.citation.publicationname | Proceedings of the 1996 MRS Fall Meeting | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Bae, Byeong-Soo | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Jun, Byung-Hyuk | - |
dc.contributor.nonIdAuthor | Han, Sang-Soo | - |
dc.contributor.nonIdAuthor | Kim, Dong-Wan | - |
dc.contributor.nonIdAuthor | Kang, Ho-Young | - |
dc.contributor.nonIdAuthor | Koh, Young-Bum | - |
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