Research overview and application trend in ferroelectric thin films

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dc.contributor.authorKim, Ho Gi-
dc.date.accessioned2013-03-15T10:02:58Z-
dc.date.available2013-03-15T10:02:58Z-
dc.date.created2012-02-06-
dc.date.issued1997-05-25-
dc.identifier.citationProceedings of the 1997 5th IEEE International Conference on Properties and Applications of Dielectric Materials. Part 1 (of 2), v.2, no., pp.990 - 994-
dc.identifier.urihttp://hdl.handle.net/10203/118488-
dc.languageENG-
dc.titleResearch overview and application trend in ferroelectric thin films-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0030653139-
dc.type.rimsCONF-
dc.citation.volume2-
dc.citation.beginningpage990-
dc.citation.endingpage994-
dc.citation.publicationnameProceedings of the 1997 5th IEEE International Conference on Properties and Applications of Dielectric Materials. Part 1 (of 2)-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKim, Ho Gi-
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MS-Conference Papers(학술회의논문)
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