DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, EJ | - |
dc.contributor.author | Kim, JS | - |
dc.contributor.author | Kim, JW | - |
dc.contributor.author | Baik, KH | - |
dc.contributor.author | Lee, Won-Jong | - |
dc.date.accessioned | 2013-03-15T09:25:11Z | - |
dc.date.available | 2013-03-15T09:25:11Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997-11-30 | - |
dc.identifier.citation | Proceedings of the 1997 MRS Fall Symposium, v.493, no., pp.183 - 188 | - |
dc.identifier.issn | 0272-9172 | - |
dc.identifier.uri | http://hdl.handle.net/10203/118240 | - |
dc.language | ENG | - |
dc.title | Effects of the addition of CF4, Cl2, and N2 to O2 ECR plasma on the etch rate, selectivity, and etched profile of RuO2 film | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0031674190 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 493 | - |
dc.citation.beginningpage | 183 | - |
dc.citation.endingpage | 188 | - |
dc.citation.publicationname | Proceedings of the 1997 MRS Fall Symposium | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Lee, Won-Jong | - |
dc.contributor.nonIdAuthor | Lee, EJ | - |
dc.contributor.nonIdAuthor | Kim, JS | - |
dc.contributor.nonIdAuthor | Kim, JW | - |
dc.contributor.nonIdAuthor | Baik, KH | - |
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