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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Formation of TiSi2 thin films from chemical vapor deposition using TiI4

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dc.contributor.authorRhee, Hwa Sungko
dc.contributor.authorJang, Tae Woongko
dc.contributor.authorBaek, Jong Taeko
dc.contributor.authorAhn, Byung Taeko
dc.date.accessioned2013-03-15T09:22:20Z-
dc.date.available2013-03-15T09:22:20Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1998-04-13-
dc.identifier.citationProceedings of the 1998 MRS Spring Symposium, pp.345 - 350-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/10203/118225-
dc.languageEnglish-
dc.publisherMRS-
dc.titleFormation of TiSi2 thin films from chemical vapor deposition using TiI4-
dc.typeConference-
dc.identifier.wosid000077430000058-
dc.identifier.scopusid2-s2.0-0032297602-
dc.type.rimsCONF-
dc.citation.beginningpage345-
dc.citation.endingpage350-
dc.citation.publicationnameProceedings of the 1998 MRS Spring Symposium-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSan Francisco, CA, USA-
dc.contributor.localauthorAhn, Byung Tae-
dc.contributor.nonIdAuthorRhee, Hwa Sung-
dc.contributor.nonIdAuthorJang, Tae Woong-
dc.contributor.nonIdAuthorBaek, Jong Tae-
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MS-Conference Papers(학술회의논문)
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