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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Control and modeling of stress in multi-stacked polysilicon films considering oxidation effect

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dc.contributor.authorLee, CS-
dc.contributor.authorJang, WI-
dc.contributor.authorChoi, CA-
dc.contributor.authorHong, YS-
dc.contributor.authorLee, JH-
dc.contributor.authorNo, Kwangsoo-
dc.contributor.authorWee, DM-
dc.date.accessioned2013-03-15T07:48:02Z-
dc.date.available2013-03-15T07:48:02Z-
dc.date.created2012-02-06-
dc.date.issued1998-09-21-
dc.identifier.citationMicromachining and Microfabrication Process Technology IV, v.3511, no., pp.315 - 324-
dc.identifier.urihttp://hdl.handle.net/10203/117544-
dc.languageENG-
dc.titleControl and modeling of stress in multi-stacked polysilicon films considering oxidation effect-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0038336231-
dc.type.rimsCONF-
dc.citation.volume3511-
dc.citation.beginningpage315-
dc.citation.endingpage324-
dc.citation.publicationnameMicromachining and Microfabrication Process Technology IV-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorLee, CS-
dc.contributor.nonIdAuthorJang, WI-
dc.contributor.nonIdAuthorChoi, CA-
dc.contributor.nonIdAuthorHong, YS-
dc.contributor.nonIdAuthorLee, JH-
dc.contributor.nonIdAuthorWee, DM-
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MS-Conference Papers(학술회의논문)
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