DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yoon, Jun-Bo | ko |
dc.contributor.author | Han, Chul-Hi | ko |
dc.contributor.author | Yoon, Euisik | ko |
dc.contributor.author | Kim, Choong Ki | ko |
dc.date.accessioned | 2013-03-15T07:46:51Z | - |
dc.date.available | 2013-03-15T07:46:51Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1998-09-21 | - |
dc.identifier.citation | Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining, pp.316 - 325 | - |
dc.identifier.uri | http://hdl.handle.net/10203/117538 | - |
dc.language | English | - |
dc.publisher | SPIE | - |
dc.title | Novel two-step baking process for high-aspect-ratio photolithography with conventional positive thick photoresist | - |
dc.type | Conference | - |
dc.identifier.wosid | 000076704600033 | - |
dc.identifier.scopusid | 2-s2.0-0032302220 | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 316 | - |
dc.citation.endingpage | 325 | - |
dc.citation.publicationname | Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining | - |
dc.identifier.conferencecountry | US | - |
dc.identifier.conferencelocation | Santa Clara, CA, USA | - |
dc.contributor.localauthor | Yoon, Jun-Bo | - |
dc.contributor.localauthor | Han, Chul-Hi | - |
dc.contributor.localauthor | Yoon, Euisik | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.