DC Field | Value | Language |
---|---|---|
dc.contributor.author | Bae, Byeong-Soo | - |
dc.contributor.author | No, Kwangsoo | - |
dc.contributor.author | Jun, BH | - |
dc.contributor.author | Han, SS | - |
dc.contributor.author | Kim, DW | - |
dc.contributor.author | Kang, HY | - |
dc.contributor.author | Koh, YB | - |
dc.date.accessioned | 2013-03-15T07:27:12Z | - |
dc.date.available | 2013-03-15T07:27:12Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997 | - |
dc.identifier.citation | MRS Symposium, v.446, no., pp.115 - 120 | - |
dc.identifier.uri | http://hdl.handle.net/10203/117372 | - |
dc.language | ENG | - |
dc.publisher | MRS | - |
dc.title | The Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography | - |
dc.title.alternative | The Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.volume | 446 | - |
dc.citation.beginningpage | 115 | - |
dc.citation.endingpage | 120 | - |
dc.citation.publicationname | MRS Symposium | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Bae, Byeong-Soo | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Jun, BH | - |
dc.contributor.nonIdAuthor | Han, SS | - |
dc.contributor.nonIdAuthor | Kim, DW | - |
dc.contributor.nonIdAuthor | Kang, HY | - |
dc.contributor.nonIdAuthor | Koh, YB | - |
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