Effects of Film Thickness and Halide Ion Incorporation on the Dielectric Property of Passivating Ta2O5 Film
- Issue Date
- 1995
- Language
- ENG
- Citation
CIMTEC World Ceramics Cong., pp.517 - 526
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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