Effects of Film Thickness and Halide Ion Incorporation on the Dielectric Property of Passivating Ta2O5 Film

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 209
  • Download : 0
Issue Date
1995
Language
ENG
Citation

CIMTEC World Ceramics Cong., pp.517 - 526

URI
http://hdl.handle.net/10203/117049
Appears in Collection
MS-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0