Effect of process conditions on the removal of native oxide in wafer cleaning process employing UV excited NF3/H2

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 210
  • Download : 0
Issue Date
1996-11
Language
KOR
Citation

KMRS Fall Symposium, pp.152 - 153

URI
http://hdl.handle.net/10203/116956
Appears in Collection
CBE-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0