High-Performance Electroplated Solenoid-Type Integrated Inductor (SI2) for RF Applications Using Simple 3D Surface Micromachining Technology

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dc.contributor.authorChul-Hi Han-
dc.date.accessioned2013-03-15T06:07:43Z-
dc.date.available2013-03-15T06:07:43Z-
dc.date.created2012-02-06-
dc.date.issued1998-
dc.identifier.citationIEDM, v., no., pp.6 - 9-
dc.identifier.urihttp://hdl.handle.net/10203/116883-
dc.languageENG-
dc.titleHigh-Performance Electroplated Solenoid-Type Integrated Inductor (SI2) for RF Applications Using Simple 3D Surface Micromachining Technology-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage6-
dc.citation.endingpage9-
dc.citation.publicationnameIEDM-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorChul-Hi Han-
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