Control of Stress Profile Two-step Phosporus Dopping in Sueface Micromachined Polysilicon Structure

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dc.contributor.authorNo, Kwangsoo-
dc.contributor.authorLee, CS-
dc.contributor.authorChung, HH-
dc.contributor.authorBaek, KH-
dc.contributor.authorLee, JH-
dc.contributor.authorYoo, HJ-
dc.date.accessioned2013-03-15T05:31:06Z-
dc.date.available2013-03-15T05:31:06Z-
dc.date.created2012-02-06-
dc.date.issued1996-01-01-
dc.identifier.citationISPSA, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/116699-
dc.languageENG-
dc.titleControl of Stress Profile Two-step Phosporus Dopping in Sueface Micromachined Polysilicon Structure-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameISPSA-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorLee, CS-
dc.contributor.nonIdAuthorChung, HH-
dc.contributor.nonIdAuthorBaek, KH-
dc.contributor.nonIdAuthorLee, JH-
dc.contributor.nonIdAuthorYoo, HJ-
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MS-Conference Papers(학술회의논문)
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