SAW characteristics of AlN films deposited on various substrates using ECR plasma enhanced CVD and reactive RF sputtering

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Issue Date
1996-11-03
Language
ENG
Citation

1996 IEEE Ultrasonics Symposium. Part 2 (of 2), v.1, pp.299 - 302

ISSN
1051-0117
URI
http://hdl.handle.net/10203/116500
Appears in Collection
MS-Conference Papers(학술회의논문)
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