Effects of NH3 Carrier Gas on the Deposition and Electrical Characterics of SrTiO3 Films Grown by ECR Plasma Assisted MOCVD

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dc.contributor.authorNo, Kwangsoo-
dc.contributor.authorLee, JS-
dc.contributor.authorSong, HW-
dc.contributor.authorJun, BH-
dc.contributor.authorYu, BG-
dc.date.accessioned2013-03-15T02:48:27Z-
dc.date.available2013-03-15T02:48:27Z-
dc.date.created2012-02-06-
dc.date.issued1996-01-01-
dc.identifier.citationInternational Symposium on Applications of Ferroelectric Thin Films, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/115831-
dc.languageENG-
dc.titleEffects of NH3 Carrier Gas on the Deposition and Electrical Characterics of SrTiO3 Films Grown by ECR Plasma Assisted MOCVD-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameInternational Symposium on Applications of Ferroelectric Thin Films-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorLee, JS-
dc.contributor.nonIdAuthorSong, HW-
dc.contributor.nonIdAuthorJun, BH-
dc.contributor.nonIdAuthorYu, BG-
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MS-Conference Papers(학술회의논문)
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