Electrochemical Properties of TiO2 Films Deposited by PECVD Method.
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 변수일 | - |
| dc.date.accessioned | 2013-03-15T01:08:06Z | - |
| dc.date.available | 2013-03-15T01:08:06Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1991 | - |
| dc.identifier.citation | Korean Corros. Sci. Soc., v., no., pp.203 - 211 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/115275 | - |
| dc.language | KOR | - |
| dc.title | Electrochemical Properties of TiO2 Films Deposited by PECVD Method. | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 203 | - |
| dc.citation.endingpage | 211 | - |
| dc.citation.publicationname | Korean Corros. Sci. Soc. | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 변수일 | - |
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