DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | ko |
dc.contributor.author | Ko, JS | ko |
dc.contributor.author | Choi, JH | ko |
dc.contributor.author | Jang, JH | ko |
dc.contributor.author | Oh, TH | ko |
dc.contributor.author | Kim, HW | ko |
dc.contributor.author | Lee, BW | ko |
dc.date.accessioned | 2009-09-24T08:51:54Z | - |
dc.date.available | 2009-09-24T08:51:54Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-07 | - |
dc.identifier.citation | POLYMER, v.45, no.16, pp.5397 - 5401 | - |
dc.identifier.issn | 0032-3861 | - |
dc.identifier.uri | http://hdl.handle.net/10203/11503 | - |
dc.description.abstract | Poly [(methacrylic acid tert-butyl cholate ester)-co-(gamma-butyrolactone-2-yl methacrylate)] was synthesized and evaluated as a new 193-nm chemically amplified photoresist. This polymer showed good thermal stability up to 240 degreesC and had a good transmittance at 193 nm. This material showed good resistance to CF4-reactive ion etching. The resist patterns of 0.15 mum feature size were obtained at a dose of 11 mJ cm(-2) using an argon fluoride excimer laser stepper. (C) 2004 Published by Elsevier Ltd. | - |
dc.description.sponsorship | KAIST BK21 | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject | NORBORNENE COPOLYMERS | - |
dc.subject | ARF LITHOGRAPHY | - |
dc.subject | DERIVATIVES | - |
dc.subject | RESIST | - |
dc.title | Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)] | - |
dc.type | Article | - |
dc.identifier.wosid | 000222927700003 | - |
dc.identifier.scopusid | 2-s2.0-4143129847 | - |
dc.type.rims | ART | - |
dc.citation.volume | 45 | - |
dc.citation.issue | 16 | - |
dc.citation.beginningpage | 5397 | - |
dc.citation.endingpage | 5401 | - |
dc.citation.publicationname | POLYMER | - |
dc.identifier.doi | 10.1016/j.polymer.2004.05.041 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Ko, JS | - |
dc.contributor.nonIdAuthor | Choi, JH | - |
dc.contributor.nonIdAuthor | Jang, JH | - |
dc.contributor.nonIdAuthor | Oh, TH | - |
dc.contributor.nonIdAuthor | Kim, HW | - |
dc.contributor.nonIdAuthor | Lee, BW | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | ArF lithography | - |
dc.subject.keywordAuthor | methacrylic acid tert-butyl cholate ester | - |
dc.subject.keywordAuthor | -gamma-butyrolactone-2-yl methacrylate | - |
dc.subject.keywordPlus | NORBORNENE COPOLYMERS | - |
dc.subject.keywordPlus | ARF LITHOGRAPHY | - |
dc.subject.keywordPlus | DERIVATIVES | - |
dc.subject.keywordPlus | RESIST | - |
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