DSpace at KOASAS: Suppression of crystal nucleation in amorphous silicon thin films by high energy ion irradiation at intermediate temperatures

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College of Natural Sciences(자연과학대학)Graduate School of Nanoscience and Technology(나노과학기술대학원)NT-Conference Papers(학술회의논문)

Suppression of crystal nucleation in amorphous silicon thin films by high energy ion irradiation at intermediate temperatures

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Shin, JungHoon researcher / Im, James S. / Atwater, Harry A.

Issue Date: 1991

Language: ENG

Citation: Materials Research Society, pp.357 - 362

URI: http://hdl.handle.net/10203/114206

Appears in Collection: NT-Conference Papers(학술회의논문)

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