Effect of CO ans CO2 addition to CF4/O2 gas system on the etch rate and selectivity of W

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dc.contributor.authorKwon, SK-
dc.contributor.authorNam, CW-
dc.contributor.authorChung, IJ-
dc.contributor.authorWoo, Seong-Ihl-
dc.date.accessioned2013-03-14T22:36:43Z-
dc.date.available2013-03-14T22:36:43Z-
dc.date.created2012-02-06-
dc.date.issued1991-
dc.identifier.citationConference on Semiconductors Materials, Component & CAD, v., no., pp.161 --
dc.identifier.urihttp://hdl.handle.net/10203/114119-
dc.languageENG-
dc.titleEffect of CO ans CO2 addition to CF4/O2 gas system on the etch rate and selectivity of W-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage161-
dc.citation.publicationnameConference on Semiconductors Materials, Component & CAD-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorWoo, Seong-Ihl-
dc.contributor.nonIdAuthorKwon, SK-
dc.contributor.nonIdAuthorNam, CW-
dc.contributor.nonIdAuthorChung, IJ-
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CBE-Conference Papers(학술회의논문)
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