DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kwon, SK | - |
dc.contributor.author | Nam, CW | - |
dc.contributor.author | Chung, IJ | - |
dc.contributor.author | Woo, Seong-Ihl | - |
dc.date.accessioned | 2013-03-14T22:36:43Z | - |
dc.date.available | 2013-03-14T22:36:43Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1991 | - |
dc.identifier.citation | Conference on Semiconductors Materials, Component & CAD, v., no., pp.161 - | - |
dc.identifier.uri | http://hdl.handle.net/10203/114119 | - |
dc.language | ENG | - |
dc.title | Effect of CO ans CO2 addition to CF4/O2 gas system on the etch rate and selectivity of W | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 161 | - |
dc.citation.publicationname | Conference on Semiconductors Materials, Component & CAD | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Woo, Seong-Ihl | - |
dc.contributor.nonIdAuthor | Kwon, SK | - |
dc.contributor.nonIdAuthor | Nam, CW | - |
dc.contributor.nonIdAuthor | Chung, IJ | - |
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