A scanning tunneling spectroscopy study on TCNQ/n-Si and/p-Si

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dc.contributor.authorLee, H.ko
dc.contributor.authorLee, N.ko
dc.contributor.authorLee, H.ko
dc.contributor.authorBae, S.S.ko
dc.contributor.authorKim, Sehunko
dc.date.accessioned2009-09-21T06:50:28Z-
dc.date.available2009-09-21T06:50:28Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2002-
dc.identifier.citationMOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.377, pp.25 - 28-
dc.identifier.issn1058-725X-
dc.identifier.urihttp://hdl.handle.net/10203/11388-
dc.description.abstractA thin film (thickness: 1.5 nm) of tetracyanoquinodimethane (TCNQ), a well-known electron acceptor, was fabricated on p-Si and n-Si using a spin casting method. The junction properties of these systems were investigated using scanning tunneling spectroscopy (STS). IN curves of the two systems showed rectifying properties with different polarity. It can provide a new technology to fabricate molecular-level rectifier if nanolithography is accomplished on these systems.-
dc.description.sponsorshipThis work was supported by the national program for tera-level nanodevices of the ministry of science and technology as one of the 21st century frontier programsen
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherTAYLOR & FRANCIS LTD-
dc.titleA scanning tunneling spectroscopy study on TCNQ/n-Si and/p-Si-
dc.typeArticle-
dc.identifier.wosid000176823900006-
dc.identifier.scopusid2-s2.0-11144247664-
dc.type.rimsART-
dc.citation.volume377-
dc.citation.beginningpage25-
dc.citation.endingpage28-
dc.citation.publicationnameMOLECULAR CRYSTALS AND LIQUID CRYSTALS-
dc.identifier.doi10.1080/10587250290088456-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Sehun-
dc.contributor.nonIdAuthorLee, H.-
dc.contributor.nonIdAuthorLee, N.-
dc.contributor.nonIdAuthorLee, H.-
dc.contributor.nonIdAuthorBae, S.S.-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordAuthorTCNQ-
dc.subject.keywordAuthorspin-coated film-
dc.subject.keywordAuthorAFM lithography-
dc.subject.keywordAuthorrectifier-
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