LP_MOCVD Process for Ferroelectric Thin Films with Precise Composition Control
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김호기 | - |
| dc.date.accessioned | 2013-03-14T22:05:41Z | - |
| dc.date.available | 2013-03-14T22:05:41Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1993 | - |
| dc.identifier.citation | The First MRS Korea-Mexico Joint Symposium on Advanced Materials and Technology, Nov. 24-25. KOEX. Seoul. Korea, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/113816 | - |
| dc.language | KOR | - |
| dc.title | LP_MOCVD Process for Ferroelectric Thin Films with Precise Composition Control | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The First MRS Korea-Mexico Joint Symposium on Advanced Materials and Technology, Nov. 24-25. KOEX. Seoul. Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 김호기 | - |
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